Huawei has filed a patent application for an extreme ultraviolet (EUV) lithography scanner, according to UDN. Chinese chipmakers might fabricate semiconductors using sub-7nm-class technology if the business develops a scanner such as this and obtains acceptable productivity, uptime, and yields. The only issue is when.
In the middle of November, Huawei submitted a patent application for an EUV scanner and its components to the State Intellectual Property Office. According to MyDrivers, the patent application appears to include every essential component of an EUV scanner, including a 13.5 nm EUV light generator (light source), a lithography system, and "control management technologies."
Even when chipmakers have access to EUV equipment, it is not equivalent to being able to create an EUV scanner, a very complex device that must be maintained flawlessly throughout a period of time.
Due to its complex operation, EUV Equipment is only available to IT companies.
Although many businesses attempted to utilize this software, only ASML was successful after more than ten years of effort and with support from Intel, Samsung, and TSMC. Currently, Intel uses or intends to use EUV scanners for high-volume chip fabrication; however, Intel has not yet begun to use or intends to employ them for high-volume chip fabrication. Only five businesses have developed (or intend to develop) process technology that is sufficiently advanced to benefit from EUV scanners.
Huawei is a leading high-tech company that generates a wide array of technologies, including but not just chips, but also wafer fabrication equipment.
